CVD SiC Electrode for Plasma Etching & Semiconductor Process Chambers

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CVD SiC Electrode for Plasma Etching & Semiconductor Process Chambers

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CVD SiC Electrode for Plasma Etching & Semiconductor Process Chambers

The CVD Silicon Carbide (SiC) Electrode is a high-performance semiconductor chamber component engineered for plasma etching, PECVD, ICP, and advanced wafer processing systems. Manufactured from high...

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CVD SiC electrode for plasma etching

SiC substrate for semiconductor chambers

SiC electrode with CVD coating

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